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<title>Session 5(A) - New materials and structures (incl. nanostructures and thin films), their analysis and specific applications II.</title>
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<author>Kostič I., Glezos N., Konečníková A., Matay L., Nemec P., Písečný P., Velessiotis D.</author>
<title>Limits to nanopatterning based on e-beam lithography</title>
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<author>Murín J., Hrabovský J., Paulech J., Kutiš V.</author>
<title>Effective material properties calculation of the FGm Bar structures</title>
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<author>Novák P., Dobročka E., Búc D., Kováč J.</author>
<title>Determination of residual stress in thin film by GIXRD</title>
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<item>
<author>Rehák M., Neilinger P., Žemlička M., Manca D., Hübner U., Il’ichev E., Grajcar M.</author>
<title>Switching effect in SQUIDs coupled by Josephson junction</title>
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<item>
<author>Zigo J., Švec P., Janičkovič D., Janotová I., Maťko I., Švec P. Sr.</author>
<title>Structure of new Al-Si based RQ systems with potentially enhanced stiffness</title>
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<author>Hrkút P., Andok R., Benčurová A., Nemec P., Konečníková A., Matay L., Haščík Š.</author>
<title>RIE plasma etching of GaAs in SiCl4 and CCl4 gases with different resists as etch masks</title>
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